EFFECT OF ANNEALING ON OPTICAL PROPERTIES OF NiO:ZnO THIN FILMS

dc.contributor.author	Herissi, L.
dc.contributor.author	Hadjeris, L.
dc.contributor.author	Azizi, S.
dc.contributor.author	Attaf, N.
dc.date.accessioned	2019-06-02T09:09:11Z
dc.date.available	2019-06-02T09:09:11Z
dc.date.issued	2018-02-05
dc.description	Séminaire National Sur Laser Solaire Et Matériaux ElOeued 5-6 Février 2018	en_US
dc.description.abstract	(ZnO)1-x(NiO)x thin films were prepared onto glass substrates by spray ultrasonic technique from zinc acetate dihydrate and nickel chloride hexahydrate solutions dissolved in distilled water. Substrate temperature, solution concentration, Nozzle-substrate distance and spray time were kept constant during all deposition process at 300°C, 0.05 mol/l, 7 cm and 15 min, respectively, with different values of x (x varies from 0.00 to 0.15). The annealing of these films were under air for 1 hour, at different annealing temperatures (300 °C, 400 °C and 500 °C). The aim of our work is to study the influence of nickel concentration and the annealing on the optical and electrical properties of (ZnO)1-x(NiO)x thin films.	en_US
dc.identifier.uri	http://dspace.univ-eloued.dz/handle/123456789/2361
dc.language.iso	en	en_US
dc.publisher	University of Eloued جامعة الوادي	en_US
dc.subject	(ZnO)1-x(NiO)x thin films, Spray ultrasonic, Annealing temperature, Optical properties, Electrical conductivity	en_US
dc.title	EFFECT OF ANNEALING ON OPTICAL PROPERTIES OF NiO:ZnO THIN FILMS	en_US
dc.type	Other	en_US

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