EFFECT OF ANNEALING ON OPTICAL PROPERTIES OF NiO:ZnO THIN FILMS

Abstract

(ZnO)1-x(NiO)x thin films were prepared onto glass substrates by spray ultrasonic technique from zinc acetate dihydrate and nickel chloride hexahydrate solutions dissolved in distilled water. Substrate temperature, solution concentration, Nozzle-substrate distance and spray time were kept constant during all deposition process at 300°C, 0.05 mol/l, 7 cm and 15 min, respectively, with different values of x (x varies from 0.00 to 0.15). The annealing of these films were under air for 1 hour, at different annealing temperatures (300 °C, 400 °C and 500 °C). The aim of our work is to study the influence of nickel concentration and the annealing on the optical and electrical properties of (ZnO)1-x(NiO)x thin films.