OPTICAL AND PHOTO-ELECTROCHEMICAL CHARACTERIZATION OF NANOSTRUCTURES DEPOSITED ON FTO SUBSTRATE

Abstract

In this study, electrodeposition was used to deposit Cu2O doped Cl thin films on FTO substrates. The effect of Cl- ions on optical properties was studied. Photoresponse of the films shows that the conduction type change from p-type to n-type behavior of Cu2O in photoelectrochemical cells. The X ray diffraction (XRD) shows that our samples were pure Cu2O. The optical characterization of Cu2O was studied by analyzing the nanostructure transmission spectrum. The thickness and the refractive index of Cu2O nanostructures were determined using the envelop method, the optical gap (Eg) and the Urbach energy (Eu) were also calculated. It was found that the thickness and refractive index increases with increasing in copper chloride concentration