Plasma-oxygen Interaction During Thin Films Deposition By Laser Ablation: Determination Of The Interaction Pressure Threshold And Effect On The Thin Films Propertiese

dc.contributor.author	Lafane S. . . . .
dc.contributor.author	Kerdja T.
dc.contributor.author	Abdelli-messaci S.
dc.contributor.author	Khereddine Y.
dc.contributor.author	Kechouane M.
dc.date.accessioned	2020-10-19T08:39:45Z
dc.date.available	2020-10-19T08:39:45Z
dc.date.issued	2012-01-01
dc.description	Articale in Journal of fundamental and Applied Sciences Vol. 04 N. 01	en_US
dc.description.abstract	In this contribution we study the effect of the oxygen pressure on the plasma dynamics during the ablation of oxides materials into an oxygen gas. The study was done using fast imaging and ion probe techniques. Both techniques revealed that a threshold oxygen pressure is needed to initiate the plume oxygen interaction. This threshold oxygen pressure depends on the ablated material. A clear effect of this threshold pressure on the structural and phase composition of the deposited thin films is shown.	en_US
dc.identifier.citation	Articale in Journal of fundamental and Applied Sciences Vol. 04 N. 01	en_US
dc.identifier.issn	1112-9867
dc.identifier.uri	http://dspace.univ-eloued.dz/handle/123456789/7154
dc.language.iso	en	en_US
dc.publisher	University of Eloued جامعة الوادي	en_US
dc.subject	Laser ablation, Plasma-oxygen interaction, Metal-insulator transition.	en_US
dc.title	Plasma-oxygen Interaction During Thin Films Deposition By Laser Ablation: Determination Of The Interaction Pressure Threshold And Effect On The Thin Films Propertiese	en_US
dc.type	Article	en_US

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Name:: PLASMA-OXYGEN INTERACTION DURING THIN FILMS DEPOSITION BY LASER ABLATION_ DETERMINATION OF THE INTERACTION PRESSURE THRESHOLD AND EFFECT ON THE THIN FILMS PROPERTIESE.pdf
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Description:: Articale in Journal of fundamental and Applied Sciences Vol. 04 N. 01

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