Elaboration and characterisation of ZnO thin films
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Date
2012
Journal Title
Journal ISSN
Volume Title
Publisher
EDP Sciences
Abstract
Abstract – Highly transparent ZnO thin films have been prepared on microscope glass
substrate using dip-coating technique. The films were obtained at a concentration of solgel solution is 0.5 M. The structural and optical properties of the ZnO thin films were studied
as a function of the annealing temperature varying between 450 to 600 ◦C. From the XRD
analysis, the whole obtained films have a hexagonal wurtzite structure with a strong (002)
preferred c-axis orientation. The grain size increased with annealing temperature indicating
an improvement in the crystallinity of the films. The average transmittance of all the films
is about 70–80% as measured by UV-vis analyzer. The band gap increased with the increase
of temperature from 3.25 to 3.42 eV. The decrease of the strain of ZnO films is probably due
to an improvement of the crystallinity of the films. The best result is achieved at 600 ◦C.
Description
Article
Keywords
ZnO; thin film; dip-coating; annealing temperature
Citation
https://www.mattech-journal.org/articles/mattech/abs/2012/07/mt120017/mt120017.html